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Ultra-pure water equipment for cleaning products in the semiconductor industry
Name: Ultra-pure water equipment for cleaning products in the semiconductor industry
Operating pressure: 1.0Mpa (Mpa)
Water resistivity: 18MΩ ¡¤ cm
Water output: 500L / H
Dimensions: 160 * 100 * 160 (cm)
Voltage: 380 (V)
Water quality: 0.55
Power: 380 (w)
Desalination rate: 99.999 (%)
Ultrapure water equipment is a water treatment equipment that can almost completely remove the conductive medium in water, and remove the non-dissociable colloidal substances, gases and organic matter to a very low degree. Semiconductors, integrated circuit chips and packages, liquid crystal displays, high-precision circuit boards, optoelectronic devices, various electronic devices, microelectronics industry, large-scale and ultra-large-scale integrated circuits require a large amount of high-purity water, ultra-pure water to clean semi-finished products and finished products. In the production of electron tubes in the photovoltaic industry, if impurities are mixed in, it will affect the emission of electrons, and then affect the amplification performance and life of electron tubes. In the production of picture tubes and cathode ray tubes, the inner wall of the fluorescent screen is coated with a layer of fluorescence by spraying or precipitation. Substances, such as copper in the preparation of pure water containing more than 8ppb, will cause luminous discoloration; iron containing more than 50ppb will cause luminescence to change color, darken, flicker and cause waste products such as bubbles, streaks, light leakage points and so on. So the quality of water is very important. The higher the integration level of integrated circuits, the higher the requirements on water quality. At present, the Ministry of Electronics Industry of China divides electronic-grade water quality technology into five industry standards, which are 18MΩ.cm, 15MΩ.cm, 10MΩ.cm, 2MΩ.cm, and 0.5MΩ.cm to distinguish different water quality.
EDI high-purity water equipment is used to produce ultra-pure water, and as a secondary desalination equipment after reverse osmosis equipment, it can produce and remove up to 10-18.2MΩ.CM. Therefore it is widely used in microelectronics industry, semiconductor industry, power generation industry, pharmaceutical industry and laboratory. It can also be used as pharmaceutical distilled water, food and beverage production water, make-up water for power plant boilers, and other applications of high-purity water.
Related processes: Ultra-pure water equipment process